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LFGS - RF Plasma Generators
Economical, Mid-Frequency Generator Tailored for Plasma Processing
- Wide-output frequency range
- Compact design
- Flexible communication protocol
The versatile, variable-frequency LFGS generator (1250 W, 40 to 500 kHz) suits a wide variety of semiconductor and general plasma-processing applications, including sputtering, reactive ion etching, plasma deposition, polymerization, and surface treatment. Its compact 19″, rack-mountable, air-cooled package eases installation and saves valuable space. With a half-bridge, class-D amplifier design, the LFGS power supply enables the lowest reflected power commercially available.
Benefits
- Support a wide variety of applications
- Access the lowest reflected power commercially available
- Easily install
- Efficiently use valuable space
Features
- Variable frequency
- Air cooling
- Enhanced operating menu , Active front panel
- Pulse mode (0 to 10 kHz) CEX operation mode 2 analog user ports
- RS-232, Ethernet, and Profibus communication