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Navigator II - RF Match Networks
Rapid, Accurate, and Reliable Digitally-Tuned Matching
The Navigator ll matching network’s advanced digital technology speeds tuning and match response time.
- Leading RF plasma methodology and control
- Advanced pulsing control with tune-while-pulsing capability
- Unprecedented insights into plasma with the integrated Z’Scan II
![SPS Series](http://www.hvproducts.de/wp-content/uploads/2021/03/rf-navigator-ii-1-removebg-preview.png)
• Digital architecture with model-based rapid tuning algorithms
• Pulsed RF power delivery
• Sweep frequency operation
• Intermodulation distortion (IMD) immunity for multi-frequency applications
• Real-time process power and impedance measurement
![AA Series](http://www.hvproducts.de/wp-content/uploads/2021/03/rf-navigator-ii-2-removebg-preview.png)
• Digital architecture with model-based rapid tuning algorithms
• Pulsed RF power delivery
• Sweep frequency operation
• Intermodulation distortion (IMD) immunity for multi-frequency applications
• Real-time process power and impedance measurement
![](http://www.hvproducts.de/wp-content/uploads/2021/03/rf-navigator-ii-3-removebg-preview.png)
• Digital architecture with model-based rapid tuning algorithms
• Pulsed RF power delivery
• Sweep frequency operation
• Intermodulation distortion (IMD) immunity for multi-frequency applications
• Real-time process power and impedance measurement
![](http://www.hvproducts.de/wp-content/uploads/2021/03/rf-navigator-ii-4-removebg-preview.png)
• Digital architecture with model-based rapid tuning algorithms
• Pulsed RF power delivery
• Sweep frequency operation
• Intermodulation distortion (IMD) immunity for multi-frequency applications
• Real-time process power and impedance measurement
The Navigator® ll is equipped with microprocessor-controlled, stepper-motor drives, and advanced tuning algorithms — enabling optimized RF power. An optional internal Z’Scan® II RF sensor provides real-time analysis of process power and impedance — allowing you to quickly identify and significantly reduce process variability. Optional Virtual Front Panel software is available for monitoring and control through a user’s computer
Benefits
- Speedily tune and improve match response time
- Tighten process control
- Increase tool throughput and product yield
- Improve reliability and cost of ownership
- Customize across a variety of chambers and processes
Power
1 to 30 kW
Frequency
400 kHz to 60 MHz
Other
Single and multiple frequency capable, ICP and CCP capable